In recent years, UV technology has been widely used in water treatment in various industries, such as microelectronics, pharmaceuticals, power generation, food and beverages, cosmetics, aquaculture, direct drinking water, etc. Ultraviolet technology can be used not only for disinfection but also for TOC (Total Organic Carbon) reduction and ozone removal. Recent developments in UV technology have greatly improved the efficiency and performance of TOC degradation.

In semiconductor manufacturing, even trace amounts of TOC in rinse water can cause serious problems for semiconductor chip production. Smaller and smaller microchips have put forward stricter requirements for ultrapure water, and have posed greater challenges to water purification system design and facility engineering. Because TOC can cause defects on the surface of the silicon wafer, resulting in short-circuiting of the electrodes. In addition, organic matter provides microorganisms with a large number of required nutrients to promote their growth and reproduction.

Some TOC levels can be reduced using activated carbon filters and reverse osmosis (RO) systems or deionization (DI) systems; however, for substantial TOC reduction, UV light is usually used as the last step in the treatment process. This is a simple and very effective method. The 185 nm radiation of the low-pressure quartz UV lamp generates hydroxyl (OH) radicals, which can oxidize most organic matter to carbon dioxide (CO2) and water (H2O). like:   TOC+UV185nm→CO2+H2O

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